For this assignment in my Pattern Development in a Computer Aided Design Environment we had to digitize into the CAD program base torso and sleeve patterns using the Lectra System and manipulate them to our own style of jacket paying specific attention to the collar, sleeve, and cuff style. After completing final technical sketches, I cleaned up, modified, and graded the garment using Modaris, completed a Variant Sheet, and created a Marker (to plot the patterns) using Diamino. A Technical Style Pac was also created for the garment.

The end result was a semi-fitted, symmetrical princess line jacket that hangs off the regular shoulder line and sits between the waist and hiplines (23’’ in length). The jacket has a flat collar with a v-neckline. The sleeve is a set-in ¾ sleeve with all-in-one roll-up cuff.  The jacket has a three-button/ buttonhole closure down center front. Other design features consist of two inseam pockets at the front yoke line.